WM-811K Spatial Defect Fingerprint Presets
Benchmark Defect Patterns
ADC INFERENCE
Pattern: Clean Nominal
(Confidence: 99.2%)
Suspected Root Cause: None (Process Healthy)
Classical Die Yield Physics Models
Defect Density Sensitivity
OBSERVED DIE YIELD
93.4%
504 / 540 Dies
POISSON: e^(-A·D₀)
90.5%
Uniform Random
MURPHY MODEL
90.6%
Triangular Distribution
SEEDS / NEG-BINOMIAL
90.7%
Defect Clustering α
SEMI Standard Test Data Format (STDF V4 Datalog Stream)
LOT: LOT-300-8842 · WAFER: #14
MIR: LotID="LOT-300-8842", TestCode="CP1", Fab="FAB-1", Tester="ADVANTEST-V93K"
WIR: WaferID="W-14", Diameter=300mm, Notch=180, TotalDies=540, Tested=540
PRR: PassCount=504, FailCount=36, GrossYield=93.33%, D0_Est=0.104/cm²
BIN_SUMMARY: Bin1=504 (93.3%), Bin2=14 (2.6%), Bin3=12 (2.2%), Bin4=6 (1.1%), Bin5=4 (0.7%)